A standard LCD 3D printer costing under 200 euros can perform microelectronic photolithography with 20-micrometer precision, enabling affordable, cleanroom-free fabrication of transistors and sensors from two-dimensional materials.
(Nanowerk Spotlight) A collaboration between the Instituto de Ciencia de Materiales de Madrid (ICMM-CSIC) and Xidian University (China) has demonstrated that a standard, low-cost LCD-based 3D printer costing less than €200 can be repurposed to perform maskless photolithography, a process that lies at the core of modern microelectronics.
Using this approach, the team fabricated field-effect transistors and photodetectors based on two-dimensional (2D) materials, achieving device performance comparable to that obtained with conventional lithography.
“We basically addressed one of the main obstacles to making microelectronic devices outside cleanrooms, the need for expensive lithography equipment, by using a standard 3D printer,” explains Andrés Castellanos-Gómez, research professor at ICMM-CSIC. “Importantly, we used it exactly as purchased, with no complex modifications and no hidden tricks. Virtually anyone, even at home, could carry out photolithography following this method.”
Fabrication process using LCD-based maskless photolithography. Each panel consists of a cross-sectional schematic (top) illustrating the fabrication step and a corresponding photograph (bottom) showing the actual process. a) Substrate preparation: A silicon substrate with a SiO2 insulating layer is used as the base for device fabrication. b) Photoresist coating: A double-layer photoresist is spin-coated onto the substrate, forming the patterning layer. c) UV exposure: The sample is placed in direct contact with the LCD screen of the MSLA 3D printer, where the desired pattern is projected as a digital mask for selective exposure. d) Development: The exposed photoresist is developed, revealing the patterned regions. e) Metal deposition: A thin layer of Ti/Au is deposited onto the substrate via evaporation, covering both the exposed and protected areas. f) Lift-off process: The remaining resist is removed, leaving behind the patterned metal electrodes, forming the final device structure. Note: The images in the bottom row are illustrative examples of each step and do not correspond to the same chip throughout the process. (Image: Reprinted from DOI:10.1002/smtd.202501336, CC BY)
The idea originated during a discussion in Castellanos-Gómez’s group.
“We were explaining to our students how a commercial maskless lithography system works,” recalls Yong Xie, professor at Xidian University. “At some point we realized that the operating principle was almost identical to that of a consumer LCD 3D printer. That was our Eureka moment.”
The team validated the concept by patterning gold electrodes and integrating MoS₂ flakes transferred using a deterministic all-dry method. The resulting devices showed clean electrical characteristics and a mobility of about 30 cm²/V·s, confirming that a €200 printer can deliver professional-grade performance.
While cleanroom maskless lithography tools routinely achieve 1–2 µm resolution, the researchers obtained 20 µm directly and estimate that 4–5 µm could be reached with minor optical adjustments.
“The nicest part is that anyone can replicate this,” notes Castellanos-Gómez. “It truly democratizes microfabrication, helping research groups that develop new nanomaterials but lack access to cleanrooms to create proof-of-concept devices and increase their visibility.”
Optical micrographs of electrodes with custom patterns fabricated using an LCD-based MSLA 3D printer. a) Hall bar configuration. b) Microstrip-like electrodes patterned to test the electrical properties of materials with in-plane anisotropy. The inset displays a magnified view of the electrode features. (Image: Reprinted from DOI:10.1002/smtd.202501336, CC BY)
The authors believe the approach can benefit small research labs, teaching facilities, and emerging startups.
“There is a growing interest in decentralizing microfabrication across Europe, the United States, and Asia,” adds Xie. “Affordable tools like this will play a key role in training the next generation of micro- and nano-engineers.”
Beyond its technical contribution, the work reflects the team’s philosophy of “Enabling Research.”
“We believe that although resources are unevenly distributed, talent is not,” says Castellanos-Gómez. “Providing accessible fabrication routes helps accelerate scientific progress and gives opportunities to talented researchers everywhere.”
Although the project ran smoothly, the group emphasizes the importance of fine-tuning process conditions.
“Developing reliable lithography recipes always requires patience,” notes Xie. “Our students Qianqian Wu and Ying Zhang did an outstanding job optimizing every parameter until the process became fully reproducible.”
Provided by Andrés Castellanos-Gómez and Yong Xie. Andrés Castellanos-Gómez is a research professor at the Instituto de Ciencia de Materiales de Madrid (ICMM-CSIC). Yong Xie is a professor at Xidian University in China. Their collaboration focuses on developing accessible tools for nanomaterials research and microfabrication.
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